Refrigeration – Processes – Circulating external gas
Patent
1990-05-07
1991-12-31
Capossela, Ronald C.
Refrigeration
Processes
Circulating external gas
62 482, 55 88, F25J 300
Patent
active
050768220
ABSTRACT:
An integrated vapor recovery system is provided in which the absorption oil used is withdrawn from the tank saturated with the vapors. The absorption oil is then chilled to about 35.degree. to 40 .degree. F. to produce a lean oil for the absorption column. The absorption column is operated at substantially or below atmospheric pressure, such that the vapors are recovered substantially by absorption alone with very little condensation. The lower pressures also reduce the likelihoods of explosive mixtures.
REFERENCES:
patent: 2001996 (1935-05-01), Whitman
patent: 2494120 (1950-01-01), Ferro, Jr.
patent: 2765877 (1956-10-01), Hartman et al.
patent: 2849150 (1958-08-01), Tompkins
patent: 2947379 (1960-08-01), Aubrey
patent: 3266262 (1965-01-01), Moragne
patent: 3303660 (1967-02-01), Berg
patent: 3648436 (1972-03-01), Schonewald et al.
patent: 3714790 (1973-02-01), Battey
patent: 3739551 (1973-06-01), Eckert
patent: 3886759 (1975-06-01), McNamee
patent: 3932159 (1976-01-01), Goldsberry
patent: 3981156 (1976-09-01), Modisette et al.
patent: 3992891 (1976-11-01), Pocrnja
patent: 4027495 (1977-06-01), Edwards
patent: 4068710 (1978-01-01), Edwards
patent: 4077789 (1978-03-01), Edwards
patent: 4490985 (1985-01-01), Wells
Klatz et al., Handbook of Natural Gas Engineering, 1959, pp. 512-513.
Burklin et al., Background Information on Hydrocarbon Emissions From Marine Terminal Operation-vol. I:Discussion, pp. 139-146, Nov. 1976.
Capossela Ronald C.
Johnson Kenneth H.
LandOfFree
Vapor recovery system does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Vapor recovery system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vapor recovery system will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1506958