Gas separation – Means within gas stream for conducting concentrate to collector
Patent
1975-03-03
1977-02-01
Lutter, Frank W.
Gas separation
Means within gas stream for conducting concentrate to collector
55 95, 55226, 55244, 55261, 55267, 261119R, 261125, 261DIG54, B01D 4702
Patent
active
040059995
ABSTRACT:
Improvements in air pollution control and polluted gas effluent treatment, both processes and apparatus; Processes and devices for sequentially several times drawing a polluted gas stream against a liquid surface under a barrier approaching the liquid surface, while adding ambient air to the stream between impacts; Processes and devices for humidifying a polluted gas stream by first drawing the stream in impact against a liquid body surface, thereafter nucleating the humidified gas stream by adding ambient air thereto, and finally again drawing the now nucleated gas stream into impact against a liquid body surface to remove the polluting particulates therefrom; Single vessel and multiple vessel multi-stage processes of treating polluted gas streams by drawing same into first impacting humidification, thereafter ambient air addition-nucleation followed by further draw-through impaction.
REFERENCES:
patent: 130545 (1872-08-01), Cartwright et al.
patent: 283025 (1883-08-01), Rowan
patent: 415646 (1889-11-01), Kusnezov
patent: 626569 (1899-06-01), Sergeant
patent: 716380 (1902-12-01), Clawson
patent: 809383 (1906-01-01), Lowe
patent: 978739 (1910-12-01), Briegel et al.
patent: 1508294 (1924-09-01), Reeves
patent: 1524333 (1925-01-01), Brandt et al.
patent: 2360981 (1944-10-01), Rupp
patent: 2409558 (1946-10-01), Gonn
patent: 3386229 (1968-06-01), Reed
patent: 3563029 (1971-02-01), Lowes
Lacey David L.
Lutter Frank W.
Scofield Thomas M.
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