Vapor-phase reaction apparatus

Details Vapor-phase reaction apparatus Vapor-phase reaction apparatus

1985-04-22

1990-06-26

Marcus, Michael S.

Coating apparatus

Gas or vapor deposition

Multizone chamber

118723, 118728, 422 49, 422186, 4272481, C23C 1650, C23C 1654

Patent

active

049362518

ABSTRACT:
A vapor phase reaction apparatus includes a reaction chamber defined by first and second walls fixed opposite each other. Third and fourth walls are introduced into the reaction chamber already having affixed to them a substrate for deposition. A reactive gas is introduced into the reaction chamber for chemical vapor deposition onto the substrate.

REFERENCES:
patent: 1387080 (1921-08-01), Smith
patent: 1426920 (1922-08-01), Sleeper
patent: 2970042 (1961-01-01), Lagerway
patent: 4235841 (1980-11-01), Zimmerman
patent: 4315479 (1982-02-01), Toole et al.
patent: 4576830 (1986-03-01), Kiss
patent: 4666734 (1987-05-01), Kamiya et al.

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