Vapor phase processing apparatus

Details Vapor phase processing apparatus Vapor phase processing apparatus

1997-12-02

1999-03-23

Bueker, Richard

Coating apparatus

Condition responsive control

118712, 118715, 118723R, 118723E, C23C 1600

Patent

active

058853529

ABSTRACT:
This invention provides a vapor phase processing apparatus which forms a film on a substrate by using a source gas, and includes a processing chamber for accommodating the substrate, a gas supply unit, having a gas supply hole, for supplying a source gas into the processing chamber, and a detection unit for detecting a degree of clogging of the gas supply holes.

REFERENCES:
patent: 5286297 (1994-02-01), Moslehi
patent: 5584933 (1996-12-01), Saito
patent: 5728253 (1998-03-01), Saito

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