Semiconductor device manufacturing: process – Miscellaneous
Reexamination Certificate
2008-12-22
2010-02-16
Coleman, W. David (Department: 2823)
Semiconductor device manufacturing: process
Miscellaneous
C156S345550, C118S730000, C257SE21002
Reexamination Certificate
active
07662733
ABSTRACT:
A method of cooling a complex electronic system includes preventing system air from passing through a front side and a rear side of a server system main board, organizing a plurality of electronic segments of the server system main board, providing cool air horizontally to the server system main board through a cool air intake provided at a position located underneath the front side and at a bottom side of the server system main board, using the cool air intake to provide the cool air to a plurality of cooling segments that redirect the cool air vertically at a 90° angle, and using a hot air exhaust after the hot air reaches the top side of the server system main board to redirect the hot air horizontally at a 90° angle and exhaust the hot air.
REFERENCES:
patent: 6164844 (2000-12-01), Okumura et al.
patent: 6465043 (2002-10-01), Gupta
patent: 2002/0083899 (2002-07-01), Komeno et al.
patent: 09-162128 (1997-06-01), None
patent: 10-219447 (1998-08-01), None
patent: 2002-175992 (2002-06-01), None
patent: 2003-347228 (2003-12-01), None
Japanese Office Action dated Mar. 31, 2009 with English Translation.
Coleman W. David
Hitachi Cable Ltd.
McGinn IP Law Group PLLC
Shook Daniel
LandOfFree
Vapor phase growth apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Vapor phase growth apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vapor phase growth apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4234374