Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent
1992-09-01
1993-09-21
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Multizone chamber
118715, 118725, C23C 1600
Patent
active
052465004
ABSTRACT:
A vapor phase growth apparatus is disclosed, which comprises a boat accommodating therein a plurality of semiconductor substrates, an inner tube surrounding the boat, an outer tube disposed outside the inner tube, a heater disposed outside the outer tube, a reaction gas injection nozzle disposed inside the inner tube and operating to eject a reaction gas against the semiconductor substrates, and a hydrogen halide gas injection nozzle disposed between the inner tube and the outer tube and operating to inject the hydrogen halide gas, wherein exhaust openings for exhausting the reaction gas are formed through a wall of the inner tube, thereby suppressing deposition of a reactant on an outer surface of the inner tube and an inner surface of the outer tube. The reaction gas injected from the reaction gas injection nozzle flows in the portion formed between the inner tube and the outer tube along with in the inner tube. Since the portion between the inner tube and the outer tube is heated by the heater disposed outside the outer tube, a reactant tends to be deposited on the outer surface of the inner tube and the inner surface of the outer tube. By injecting the hydrogen halide gas from the hydrogen halide gas injection nozzle to the portion formed between the inner tube and the outer tube, the deposition of the reactant can be suppressed.
REFERENCES:
Proceeding of 34th Symposium on Semiconductors and Integrated Circuit Technology (1988), pp. 19-24, T. Suzaki et al.
Extended Abstracts of the Japan Society of Applied Physics and Related Societies, 31p-ZF-11, S. Shishiguchi et al., (The 37th Spring Meeting, 1990).
John O. Borland and Clifford I. Drowley, "Advanced Dielectric Isolation Through Selective Epitaxial Growth Techniques", Solid State Technology, Aug. 1985, pp. 141-148.
Matsushita Yoshiaki
Samata Shuichi
Bueker Richard
Kabushiki Kaisha Toshiba
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