Vapor phase deposition apparatus

Details Vapor phase deposition apparatus Vapor phase deposition apparatus

1980-09-30

1982-02-23

Smith, John D.

Coating apparatus

Gas or vapor deposition

With treating means

118729, 118733, C23C 1308

Patent

active

043164307

ABSTRACT:
A vapor phase deposition apparatus includes a coaxially mounted reactor tube, jacketed assembly tube, bearing/plug assembly, and rod/substrate holder. Gas inlets are provided in the reactor tube, and assembly tube and a vent is provided on the jacketed portion of the assembly tube, such that a double counterflow gas pattern can be established in the apparatus. The apparatus permits controllable deposition cycle and it can be readily disassembled for periodic maintenance.

REFERENCES:
patent: 3310425 (1967-03-01), Goldsmith
patent: 3361600 (1968-01-01), Reisman et al.
patent: 3394390 (1968-07-01), Cheney
patent: 3493220 (1970-03-01), Kagdis et al.
patent: 3600242 (1971-08-01), Berkenblit et al.
patent: 3675619 (1972-07-01), Burd
patent: 3701682 (1972-10-01), Gartman et al.
patent: 3716405 (1973-02-01), Mahn-Jick Lim
patent: 3828722 (1974-08-01), Reuter et al.
patent: 4116733 (1978-09-01), Olsen et al.
patent: 4129090 (1978-12-01), Inaniwa et al.

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