Vapor-liquid contacting tray with vapor thrust means

Gas and liquid contact apparatus – Contact devices – Wet baffle

Patent

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Details

261114R, B01D 322

Patent

active

041743636

ABSTRACT:
A vapor-liquid contacting tray is disclosed having an enclosure member overlying and extending transversely across the tray deck top surface from a portion above a tray support ring to an adjacent perforated portion of the tray deck wherein the perforation openings are unobstructed by the support ring. A vapor flow opening is located in the enclosure member over the portion of the tray deck above the support ring. Vapor flowing into the enclosure member from the overlaid tray deck perforation openings is directed through the vapor flow opening into the liquid on the tray deck surface portion overlying the support ring, to effect vapor-liquid contacting and prevent liquid flow stagnation thereon.

REFERENCES:
patent: 2210808 (1940-08-01), Glitsch
patent: 2582657 (1952-01-01), Serner
patent: 2611457 (1952-09-01), Glitsch
patent: 2681820 (1954-06-01), Rapisarda et al.
patent: 2787453 (1957-04-01), Hibshman et al.
patent: 3053520 (1962-09-01), Streuber
patent: 3282576 (1966-11-01), Bruckert et al.
patent: 3417975 (1968-12-01), Williams et al.
patent: 3759497 (1973-09-01), Black

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