Vapor liquid contacting

Gas and liquid contact apparatus – Contact devices – Wet baffle

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Details

55257PV, 55257PP, 202158, 202264, 203 86, 261114JP, B01F 304

Patent

active

043010989

ABSTRACT:
A vapor liquid contacting apparatus having improved column throughput and mass transfer efficiency featuring, in one aspect, an overlay for dissipating vapor hole momentum and reducing vertical oscillations in the liquid vapor dispersion on the tray, and, in another aspect, an improved inlet weir.

REFERENCES:
patent: 1748595 (1930-02-01), Chillas, Jr. et al.
patent: 2693949 (1954-11-01), Huggins
patent: 2737377 (1956-03-01), Huggins et al.
patent: 2809821 (1957-10-01), Constantikes
patent: 2832578 (1958-04-01), Gilmore
patent: 2884236 (1959-04-01), Maille
patent: 3282576 (1966-11-01), Bruckert et al.
patent: 3467365 (1969-09-01), Webster
patent: 3550916 (1970-12-01), Hoppe et al.
patent: 3573172 (1971-03-01), Streuber
patent: 3647192 (1972-03-01), De Groot et al.
patent: 3700216 (1972-10-01), Uitti et al.
patent: 3729179 (1973-04-01), Keller
patent: 3784175 (1974-01-01), Hirao et al.
patent: 3887665 (1975-06-01), Mix et al.
patent: 4105723 (1978-08-01), Mix
patent: 4184857 (1980-01-01), Iijima et al.
patent: 4207276 (1980-06-01), Ronkainen et al.
Sherwood, T. K. and Pigford, R. L., Absorption and Extraction, 2nd Ed., McGraw-Hill, New York, 1952, pp. 236-240.
Wallis, G. B.; One-Dimensional Two-Phase Flow, McGraw-Hill, New York, 1969, pp. 336-339.
Hoppe et al., (B) "Experience with Indus. Application of _Perform-Kontakt Trays", Chemische Technik (1971).
Winter et al., Froth Initiators Can Improve Tray Performance", CEP, Sep. 1976, pp. 50-53.
Raskop, F., "Perform-Kontakt Plates", The Chemical Engineer, Nov. 1974, pp. 709-712.

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