Vapor growth apparatus for semiconductor devices

Details Vapor growth apparatus for semiconductor devices Vapor growth apparatus for semiconductor devices

1993-07-21

1994-09-06

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118724, 118730, C23C 1600

Patent

active

053444922

ABSTRACT:
A vapor growth apparatus has a susceptor which rotates in a water cooled reaction tube with holding semiconductor susbstrates thereon. A heater is provided in order to heat the susceptor and to maintain a predetermined temperature. This heater is comprised of an inner heater, which heats the inner part of the susceptor, and a peripheral heater, which heats the peripheral part of the susceptor. The peripheral heater is made thicker than the inner heater. In addition, these inner and peripheral heaters are connected in parallel with each other. So, the peripheral heater can generate more heat than the inner heater so as to compensate the temperature decrease in the peripheral part of the susceptor, without loosing the mechanical strength of the whole heater.

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