Cleaning and liquid contact with solids – Apparatus – Sequential work treating receptacles or stations with means...
Patent
1986-01-21
1988-04-12
Coe, Philip R.
Cleaning and liquid contact with solids
Apparatus
Sequential work treating receptacles or stations with means...
134 76, 134 82, 134105, 134114, B08B 704, B08B 1502
Patent
active
047367580
ABSTRACT:
A vapor drying apparatus for semiconductor wafers, which is capable of preventing dust particles from entering the interior of the vapor drying apparatus incorporating therein a water washing part and a vapor drying part for a semiconductor wafer and, at the same time, thoroughly removing from the surface of a vapor dried semiconductor wafer the vapor cleaner adhering in the form of film or in a molecular thickness to the surface of an organic substance contained in the cleaner thereby bring the surface of the semiconductor wafer to an ideally cleaned and dried state.
REFERENCES:
patent: 2248662 (1941-07-01), Edhofer et al.
patent: 2352709 (1944-07-01), Haase
patent: 2689198 (1954-09-01), Judd
patent: 2896640 (1959-07-01), Randall et al.
patent: 4236392 (1980-12-01), Sando et al.
Coe Philip R.
Wacom Co. Ltd.
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