Vapor drying apparatus

Details Vapor drying apparatus Vapor drying apparatus

1987-10-14

1988-10-18

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

Sequential work treating receptacles or stations with means...

34 78, 219275, B08B 704

Patent

active

047779705

ABSTRACT:
A vapor drying apparatus for semiconductor wafers, which is capable of preventing dust particles from entering the interior of the vapor drying apparatus incorporating therein a water washing part and a vapor drying part for a semiconductor wafer and, at the same time, thoroughly removing from the surface of a vapor dried semiconductor wafer the vapor cleaner adhering in the form of film or in a molecular thickness to the surface or an organic substance contained in the cleaner thereby bringing the surface of the semiconductor wafer to an ideally cleaned and dried state.

REFERENCES:
patent: 2248662 (1941-07-01), Edhofer et al.
patent: 2352709 (1944-07-01), Haase
patent: 2689198 (1954-09-01), Judd
patent: 2896640 (1959-07-01), Randall et al.
patent: 4077467 (1978-03-01), Spigarelli
patent: 4236392 (1980-12-01), Sando et al.
patent: 4558524 (1985-12-01), Peck et al.

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