Vapor drier for semiconductor wafers and the like

Details Vapor drier for semiconductor wafers and the like Vapor drier for semiconductor wafers and the like

1990-06-21

1991-10-01

Bennett, Henry A.

Drying and gas or vapor contact with solids

Apparatus

With means to treat gas or vapor

34 74, 34 73, F26B 2106

Patent

active

050521268

ABSTRACT:
A drier for wafers or the like has a drier chamber shaped to receive the wafer, which is lowered into the open top of the drier chamber and withdrawn therefrom by a lifter, which may be motor actuated. Below the drier chamber is a heater chamber to vaporize alcohol or other liquid, which rises and condenses on the relatively cool wafer. A water jacket around the top of the drier chamber condenses vapor and thus reduces escape of vapor.

REFERENCES:
patent: 4777970 (1988-10-01), Kusuhara
patent: 4841645 (1989-06-01), Bettcher et al.
patent: 4868996 (1989-09-01), Ohmori et al.

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