Vapor deposition system and vapor deposition method

Details Vapor deposition system and vapor deposition method Vapor deposition system and vapor deposition method

2006-06-14

2011-11-22

Kackar, Ram (Department: 1716)

Coating apparatus

Gas or vapor deposition

C156S345330

Reexamination Certificate

active

08062425

ABSTRACT:
There is provided a device or a method including a flow path switching unit which switches a first flow path for releasing the vapor deposition material evaporated from a vapor depositing source from the same into a chamber, and a second flow path for causing the vapor deposition material evaporated from the vapor depositing source to flow from the vapor depositing source through a transfer path into a recovery container. The vapor deposition system or the vapor deposition method is capable of reducing an amount of a vapor deposition material consumed without being deposited on an object not to be processed during non-vapor deposition.

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Machine Translation from the Japanese Patent Office database of JPLO No. H11-229123.

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