Vapor deposition process and apparatus therefor

Details Vapor deposition process and apparatus therefor Vapor deposition process and apparatus therefor

2008-07-01

2008-07-01

Bueker, Richard (Department: 1763)

Coating apparatus

Control means responsive to a randomly occurring sensed...

Responsive to condition of coating material

C118S708000, C118S722000, C118S7230EB, C118S726000

Reexamination Certificate

active

10709668

ABSTRACT:
An apparatus for depositing a ceramic coating on a component. The apparatus includes an evaporation source containing multiple different oxide compounds, at least one of the oxide compounds having a vapor pressure that is higher than the remaining oxide compounds, to deposit on the component a coating of the multiple oxide compounds. The apparatus further includes a device for introducing the evaporation source into a coating chamber, a device for suspending the component near the evaporation source, a device for projecting a high-energy beam on the evaporation source to melt and form a vapor cloud of the oxide compounds of the evaporation source, a device capable of preventing the vapor cloud from contacting and condensing on the component, and a device for moving the preventing device to allow the vapor cloud to contact and condense on the component.

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patent: 2002/0110698 (2002-08-01), Singh

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