Vapor deposition of semiconductor material

Details Vapor deposition of semiconductor material Vapor deposition of semiconductor material

1986-10-17

1987-10-06

Pianalto, Bernard D.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 38, 427 74, 427253, 4272552, 4272555, 427294, 437225, B05D 306

Patent

active

046982345

ABSTRACT:
Precursor gaseous mixtures from which to glow discharge deposit wide and narrow band gap semiconductor alloy material, said material characterized by improved photoconductivity and stability and improved resistance to photodegradation. There is also specifically disclosed a method of fabricating a narrow band gap semiconductor which method does not suffer from the effects of differential depletion of the components of the precursor gaseous mixture.

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