Vapor deposition of anti-stiction layer for micromechanical...

Details Vapor deposition of anti-stiction layer for micromechanical... Vapor deposition of anti-stiction layer for micromechanical...

2011-04-19

2011-04-19

Kackar, Ram N (Department: 1716)

Coating apparatus

Gas or vapor deposition

C210S294000, C210S321600, C210S322000, C210S324000, C210S346000, C156S345330, C156S345340

Reexamination Certificate

active

07927423

ABSTRACT:
A vapor deposition system includes a filter-diffuser device connected to a vapor inlet within a vacuum chamber for simultaneously filtering inflowing vapor to remove particulate matter while injecting vapor containing perfluordecanoic acid (PFDA) into the chamber through radially arranged porous metal filters to enable the deposition of a uniform monolayer of PFDA molecules onto the surfaces of a micromechanical device, such as a digital micromirror device.

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patent: WO 2004100249 (2004-11-01), None

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