Vapor deposition method for depositing a film of fluorine-contai

Details Vapor deposition method for depositing a film of fluorine-contai Vapor deposition method for depositing a film of fluorine-contai

1993-09-17

1995-10-03

Jones, W. Gary

Glass manufacturing

Processes of manufacturing fibers, filaments, or preforms

Process of manufacturing optical fibers, waveguides, or...

65388, 65413, 65 607, 65DIG16, 65390, 427166, C03B 804

Patent

active

054548470

ABSTRACT:
A deposition method for vapor deposition of a film of fluorine-containing glass on a substrate in which said substrate is put into contact with fluxs of the vapors of the various constituents of said glass, wherein said vapor fluxs are emitted simultaneously from at least two crucibles, a first crucible containing a host bath and main metal fluorides that constitute said fluorine-containing glass, and at least one second crucible containing dopants constituted by at least one rare earth halide.

REFERENCES:
patent: 5071460 (1991-12-01), Fujiura et al.
Japanese Patent Abstract 63-199860 dated Aug. 18, 1988.

Affiliated with

Also associated with

Rating

Vapor deposition method for depositing a film of fluorine-contai does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Vapor deposition method for depositing a film of fluorine-contai, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vapor deposition method for depositing a film of fluorine-contai will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1074882