Vapor-deposition material for the production of high-refraction

Details Vapor-deposition material for the production of high-refraction Vapor-deposition material for the production of high-refraction

1993-03-19

1994-08-23

Green, Anthony

Coating processes

Optical element produced

427166, 4272481, 427255, 427566, 423263, 423598, 501134, C01F 1700, C01G 2300

Patent

active

053406079

ABSTRACT:
The invention relates to a vapor-deposition material for the production of high-refraction optical coatings by coating substrates in vacuo. The material is a compound of the formula La.sub.2 TiO.sub.7-x where x=from 0.3 to 0.7.

REFERENCES:
patent: 4874598 (1989-10-01), Oda et al.
patent: 5096642 (1992-03-01), Shirasaki
Ainger, F. W. et al, "Transparent Pb.sub.1-x La.sub.x (HF.sub.1-y Ti.sub.y)O.sub.3 electrooptic ceramic" Journal of Materials Science No. 12, Aug. 1973 pp. 1825-1827.
Nanamatsu, S. et al "A New Ferroelectric:(L.sub.22 Ti.sub.2 O.sub.7)", Ferroelectrics, vol. 8, No. 1/2, pp. 511-513, pt #1974.

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