Vapor deposition apparatus with mask means

Details Vapor deposition apparatus with mask means Vapor deposition apparatus with mask means

1971-03-24

1976-11-16

Kaplan, Morris

Coating apparatus

With vacuum or fluid pressure chamber

118 49, C23C 1308

Patent

active

039917070

ABSTRACT:
In vapor deposition apparatus, a plurality of spaced substrates on a rotatable horizontally disposed support, a vapor source disposed below said support and offset with respect to the axis of rotation of the support, and a mask extending approximately 180.degree. which is uniformly disposed and diametrically opposed with respect to said source whereby the effective vapor stream is generally normal to exposed substrates. A continuously exposed monitor chip is provided.

REFERENCES:
patent: 2351537 (1944-06-01), Osterberg et al.
patent: 2997979 (1961-08-01), Tassara
patent: 3048146 (1962-08-01), Coppola

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