Vapor deposition apparatus with computer control

Details Vapor deposition apparatus with computer control Vapor deposition apparatus with computer control

1973-06-07

1976-09-14

Kaplan, Morris

Coating apparatus

With vacuum or fluid pressure chamber

118 8, 118 491, C23c 1308

Patent

active

039800423

ABSTRACT:
An electric precipitation device and a method of producing highly pure semiconductor rods, in particular semiconductor rods consisting of silicon, by means of thermal decomposition and precipitation on corresponding carrier members in which a heating current which traverses the thickening carrier member is utilized for controlling at least one additional parameter which influences the precipitation of the semiconductor material. A process computer is preferably utilized for effecting control.

REFERENCES:
patent: 3171755 (1965-03-01), Reuschel et al.
patent: 3316386 (1967-04-01), Yaffee et al.
patent: 3347701 (1967-10-01), Yamagishi et al.
patent: 3459152 (1969-08-01), Garrison et al.

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