Vapor deposition apparatus for using solid starting materials

Details Vapor deposition apparatus for using solid starting materials Vapor deposition apparatus for using solid starting materials

1993-02-17

1994-08-02

Owens, Terry J.

Coating apparatus

Gas or vapor deposition

With treating means

118715, 118726, 118728, 118730, 4272552, C23C 1644

Patent

active

053342500

ABSTRACT:
A vapor deposition apparatus for depositing thin film on substrates in which solid starting materials are used. In this apparatus, a carrier gas flows up and down in the same direction as gas convection, such that the effect of gas convection is minimized and film thickness and impurity concentration are uniform over the substrate surface. This uniformity is achieved by orienting a main reaction tube in a vertical direction, attaching two branch reaction tubes at the top of the main reaction tube, and venting carrier gas out the bottom of the main reaction tube. Alternately, the main reaction tube can be oriented horizontally, with the substrates being carried on a holder within a container having pores on its top and bottom.

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Prabhu, R. S., "Chemical Vapor Depositon of Molybdenum", IBM Technical Disclosure Bulletin, vol. 13, No. 9 (Feb. 1971) p. 2535.

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