Vapor deposition apparatus and method of using same

Details Vapor deposition apparatus and method of using same Vapor deposition apparatus and method of using same

1985-11-29

1987-11-03

Bueker, Richard

Coating apparatus

Gas or vapor deposition

118725, 4272552, C23C 1600

Patent

active

047037180

ABSTRACT:
An apparatus for the treatment of a substrate with two or more gases includes a reaction chamber with an outlet and an inlet, and a gas introduction manifold comprising a closed hollow body with a cylindrical interior. Feed ports, extending through a wall of the body, are integral with valves disposed about said body. An aperture extends through an end surface of the body which aperture is connected to the inlet of the chamber. The valves are disposed such that they are at equal distances from the center axis of the inlet.

REFERENCES:
patent: 4103042 (1978-07-01), Winters
patent: 4368098 (1983-01-01), Manasevit
patent: 4369031 (1983-01-01), Goldman et al.
patent: 4422888 (1983-12-01), Stutius
patent: 4509456 (1985-04-01), Kleinert et al.

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