Vapor deposition apparatus

Details Vapor deposition apparatus Vapor deposition apparatus

1997-09-02

1999-12-28

Tentoni, Leo B.

Coating apparatus

Gas or vapor deposition

With treating means

118 50, 118728, 118733, 156345, 20429809, C23C 1646

Patent

active

060076348

ABSTRACT:
An apparatus (10) for decomposing and depositing gaseous metal carbonyls on a mandrel (36). A base plate (12) and cover (14) define a reaction chamber (20). A mandrel ring (28), nested within the base plate (12) and insulated therefrom, supports the mandrel (36). Heat transfer fluid flows through the mandrel ring (28) and into the mandrel (36) to maintain the mandrel (36) at a predetermined temperature to initiate thermal decomposition.

REFERENCES:
patent: 2496054 (1950-01-01), Hoyler
patent: 4496609 (1985-01-01), McNeilly et al.
patent: 5169549 (1992-12-01), Weber
patent: 5470651 (1995-11-01), Milinkovic et al.
patent: 5591485 (1997-01-01), Weber
"Toolmaking Without Machining . . . Long Term Research Pays Off.", Black, T.W., The Tool Engineer, vol. 44, No. 6, 1960, pp. 101-104.

Affiliated with

Also associated with

Rating

Vapor deposition apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Vapor deposition apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vapor deposition apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2379653