Vapor deposition apparatus

Details Vapor deposition apparatus Vapor deposition apparatus

1976-02-17

1976-12-28

Kaplan, Morris

Coating apparatus

With vacuum or fluid pressure chamber

118 48, C23C 1308

Patent

active

039995062

ABSTRACT:
Method and apparatus are provided for depositing a coating of uniform thickness across a substrate coated by a vapor-deposition process, for confining and directing the vapor to the substrate in a manner to minimize vapor loss, and for conveniently collecting vapor which bypasses the substrate. A pair of opposed adjustable barrier plates extend transverse to walls defining the path from a vapor source. Means feed a substrate strip in the plane of and between said plates. Condenser rolls overlie the space between corresponding edges of said plates and strip. Means recover coating material condensed into said rolls. Additional means associated with the underside of said strip, disposed transverse to the plate means and external to said walls, further inhibit vapor loss.

REFERENCES:
patent: 1160980 (1915-11-01), Geer
patent: 3333981 (1967-08-01), Kinsella et al.

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