Vapor-deposited film

Details Vapor-deposited film Vapor-deposited film

2006-09-26

2006-09-26

Nakarani, D. S. (Department: 1773)

Stock material or miscellaneous articles

Composite

Of polycarbonate

C428S425900, C428S447000, C428S451000, C428S477700, C428S480000, C428S521000, C428S522000, C428S523000, C428S532000

Reexamination Certificate

active

07112370

ABSTRACT:
A vapor-deposited film having a substrate consisting essentially of a polymer material and a vapor-deposited layer consisting essentially of a ceramic, the substrate being subjected to plasma pre-treatment using a hollow anode plasma treatment device, prior to vapor deposition of the vapor-deposited layer.

REFERENCES:
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patent: 5645923 (1997-07-01), Matsuo et al.
patent: 5935662 (1999-08-01), Woolley et al.
patent: 6106933 (2000-08-01), Nagai et al.
patent: 6706412 (2004-03-01), Yializis
patent: 3-285061 (1991-12-01), None
patent: 5-287498 (1993-11-01), None
patent: 2000-52475 (2000-02-01), None
patent: 2001-88239 (2001-04-01), None
Translation of PCT International Preliminary Examination Report for International Application No. PCT/JP02/07432. International Filing Date Jul. 23, 2002 (3 pgs.).

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