Vapor collection method and apparatus

Details Vapor collection method and apparatus Vapor collection method and apparatus

2011-04-05

2011-04-05

Rinehart, Kenneth B (Department: 3743)

Drying and gas or vapor contact with solids

Process

Gas or vapor contact with treated material

C034S448000, C034S444000

Reexamination Certificate

active

07918038

ABSTRACT:
An apparatus and method for treating a moving substrate of indefinite length. The apparatus has a control surface positioned in close proximity to a surface of the substrate to define a control gap between the substrate and the control surface. A first chamber is positioned near the control surface, with the first chamber having a gas introduction device. A second chamber is positioned near the control surface, the second chamber having a gas withdrawal device. The control surface and the chambers together define a region wherein the adjacent gas phases possess an amount of mass. Upon inducement of at least a portion of the mass within the region, the mass flow is controlled to significantly reduce dilution of the gas phase component in the adjacent gas phase. This is accomplished through the introduction of a controlled gas stream thereby reducing the flow of an uncontrolled ambient gas stream due to pressure gradients in the system.

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