Heat exchange – Intermediate fluent heat exchange material receiving and... – Liquid fluent heat exchange material
Reexamination Certificate
2011-03-29
2011-03-29
Ciric, Ljiljana (Lil) V (Department: 3785)
Heat exchange
Intermediate fluent heat exchange material receiving and...
Liquid fluent heat exchange material
C165S080400, C361S700000
Reexamination Certificate
active
07913748
ABSTRACT:
A vapor chamber includes a plate and a wick structure. The plate is provided therein with a working fluid, and the plate has a heated end and a condensed end. The wick structure includes a first wick portion adhered to be opposite to the heated end, a second wick portion overlapping on the first wick portion, and a third wick portion adhered on the rest portion of a chamber. The aperture diameter of the first wick portion is larger than that of the second wick portion, or the aperture density of the first wick portion is smaller than that of the second wick portion. The amount of working fluid attached to the second wick portion is smaller than that of the first wick portion. After heating, the working fluid attached to the second wick portion is vaporized more quickly.
REFERENCES:
patent: 3681843 (1972-08-01), Arcella et al.
patent: 4108239 (1978-08-01), Fries
patent: 5076352 (1991-12-01), Rosenfeld et al.
patent: 6460612 (2002-10-01), Sehmbey et al.
patent: 6650544 (2003-11-01), Lai
patent: 6871701 (2005-03-01), Ueki et al.
patent: 7431071 (2008-10-01), Wenger
patent: 7543629 (2009-06-01), Chin et al.
patent: 7677299 (2010-03-01), Zheng
patent: 2003/0051859 (2003-03-01), Chesser et al.
patent: 2004/0040696 (2004-03-01), Cho et al.
patent: 2006/0162906 (2006-07-01), Hong et al.
patent: 2006/0162907 (2006-07-01), Wu et al.
patent: 2006/0169439 (2006-08-01), Hong et al.
patent: 2006/0213646 (2006-09-01), Hsu
patent: 2006/0260786 (2006-11-01), Hsu
patent: 2007/0187072 (2007-08-01), Chin et al.
patent: 2007/0246194 (2007-10-01), Hou et al.
patent: 2007/0261243 (2007-11-01), Yang et al.
Cheng Chih-Hung
Huang Ju-Tsu
Lin Chen-Hsiang
Lin Kuo-Len
Liu Wen-Jung
Ciric Ljiljana (Lil) V
CPUMATE Inc.
Golden Sun News Techniques Co., Ltd.
HDLS IPR Services
Shih Chun-Ming
LandOfFree
Vapor chamber does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Vapor chamber, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vapor chamber will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2632874