Vapor and ion source

Details Vapor and ion source Vapor and ion source

1988-11-30

1991-06-18

LaRoche, Eugene R.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Electron or ion source

31511121, 31511141, 31323131, 250423R, H01J 2702

Patent

active

050251945

ABSTRACT:
A vapor and ion source includes, in a low pressure chamber, an anode (M), a cathode (K) and a device (A) for applying a magnetic field (B). The cathode (K) is an equipotential cavity (10) provided with an aperture (11) in a front plate. A magnetic field (B) orthogonal to the front plate is applied thereto. The material to be ionized (15) is arranged inside the cavity.

REFERENCES:
patent: 2977495 (1961-03-01), Klein
patent: 3223885 (1965-12-01), Stauffer
patent: 3411035 (1968-11-01), Necker et al.
patent: 3414702 (1968-12-01), Stauffer
patent: 4780642 (1988-10-01), Jacquot
patent: 4886992 (1989-12-01), Menet et al.
V. A. Saenko et al., "Metal-Ion Source with Hot Hollow Cathode," Instruments and Experimental Techniques, vol. 30, No. 1, part 2, Jan.-Feb. 1987, pp. 168-170, Plenum Publishing Corp., New York.
V. A. Saenko et al., "Plasma Evaporator" Instruments and Experimental Techniques, vol. 26, No. 4, part 2, Jul.-Aug. 1983, pp. 926-928, Plenum Publishing Corp., New York.
M. Mingxtu et al., "A Hollow Cold Cathode Multipurpose Ion Source," Nuclear Instruments and Methods in Physics Research/Section B, vol. B21, Nos. 2-4, Mar. 22, 1987, pp. 182-185, North-Holland Publishing Amsterdam.
J. H. Freeman et al., "The Technology and Chemistry of Heavy Ion Sources," Nuclear Instruments and Methods, vol. 107, No. 3, Mar. 15, 1973, pp. 477-492, North-Holland Publishing Co., Amsterdam.

Affiliated with

Also associated with

Rating

Vapor and ion source does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Vapor and ion source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vapor and ion source will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-147278