Vacuum wafer transport and processing system and method using a

Details Vacuum wafer transport and processing system and method using a Vacuum wafer transport and processing system and method using a

1990-05-21

1991-11-26

Kunemund, Robert

Metal working

Barrier layer or semiconductor device making

414217, 414221, 118719, 118729, H01L 2130, H01L 2146, H01L 2150, C23C 1456

Patent

active

050672185

ABSTRACT:
A vacuum wafer transport and processing system and method includes a central vacuum chamber having wafer holding means disposed therein. A plurality of wafer transport arms are disposed between the central vacuum chamber and a plurality of wafer process chambers. The wafer transport arms transport wafers between the various process chambers and the central vacuum chamber so that multiple processing steps may be performed in a vacuum.

REFERENCES:
patent: 3404661 (1965-08-01), Mathias et al.
patent: 4498416 (1985-02-01), Bouchaib et al.
patent: 4643627 (1987-02-01), Bednorz et al.
patent: 4664062 (1987-05-01), Kamohara et al.
patent: 4923584 (1990-05-01), Bramhall, Jr. et al.

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