Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent
1989-10-18
1991-03-26
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Multizone chamber
118724, 118725, C23C 1600
Patent
active
050020102
ABSTRACT:
Pre- and post-processing of a semiconductor wafer within a main vacuum chamber is accomplished by a wafer holder disposed within a clam shell-like device. The clam shell device includes a first member disposed above the wafer holder and a second member disposed below the wafer holder in a facing relationship to the first member. The first member and the second member each have a respective mating surface. The first member and the second member are movable between a closed position wherein the mating surface of each of the first member and second member hermetically engage each other in an open position. The clam shell device forms an interior chamber when in its closed position. Gases are evacuated from the interior chamber, exteriorally of the main chamber, when the clam shell device is in in a closed position to avoid contamination of the vacuum environment.
REFERENCES:
patent: 3505974 (1970-04-01), Barker
patent: 3568632 (1971-03-01), Cawthon
patent: 3915117 (1975-10-01), Schertler
patent: 4224897 (1980-08-01), Dugdale
patent: 4313783 (1982-02-01), Davies
patent: 4338883 (1982-07-01), Mahler
patent: 4534314 (1985-08-01), Ackley
patent: 4607593 (1986-08-01), Van Hemel
patent: 4664062 (1987-05-01), Kamohara et al.
patent: 4692233 (1980-09-01), Casey
patent: 4709655 (1987-12-01), Van Mastrigt
patent: 4795299 (1989-01-01), Boys et al.
patent: 4824545 (1989-03-01), Arnold et al.
Bueker Richard
Cole Stanley Z.
Novack Sheri M.
Sgarbossa Peter J.
Varian Associates Inc.
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