Vacuum vapor-deposition system

Details Vacuum vapor-deposition system Vacuum vapor-deposition system

1985-10-29

1987-09-01

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Crucible or evaporator structure

118728, 118733, C23C 1426

Patent

active

046900985

ABSTRACT:
In a vacuum vapor-deposition system a substrate holder is arranged stationary in the main part of a vapor-deposition chamber. Evaporation apparatuses are arranged on the floor of the vapor-deposition chamber, which is moveably connected to the main part of the vacuum-deposition chamber via a bellows and can swivel about two mutually intersecting axes or be displaced along two mutually intersecting axes with respect to the main part by means of two drive mechanisms. In this way the thermostatization of the substrate and the production of very uniform layers is facilitated.

REFERENCES:
patent: 2551389 (1951-05-01), Oliver
patent: 3625180 (1971-12-01), Smith
patent: 3714925 (1973-02-01), Helm
patent: 4137865 (1979-02-01), Cho
patent: 4201152 (1980-05-01), Luscher
patent: 4201746 (1980-05-01), Burd et al.
patent: 4226208 (1980-10-01), Nishida
patent: 4392453 (1983-07-01), Luscher
DE-Prospekt: Varian, Molecular Beam Epitaxy System, 1977, J. Applied Phys, 46, No. 6, Jun. 1975, pp. 2366-2374.

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