Vacuum vapor-deposition installation with a vacuum chamber, a va

Coating apparatus – Gas or vapor deposition – Multizone chamber

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118727, 118729, 118733, C23C 1308

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043388833

ABSTRACT:
A vacuum vapor-deposition installation for batchwise operation has a horizontal valve chamber which is arranged in the middle and on which are fitted, by way of suitable openings, a top vaporizing chamber and a lower evaporizing chamber. The two openings are aligned with each other and can be sealed simultaneously in a vacuum-tight manner by a two-way valve movable horizontally in the valve chamber. For the purpose of charging the vaporizing chamber with substrates, this chamber can be lifted from the valve chamber. To solve the problem of increasing the number of production cycles per unit of time, the interior of the evaporizing chamber is accessible from the exterior without interrupting the vacuum in the valve chamber. This measure renders it unnecessary to charge the evaporizer in the evaporizing chamber through the valve chamber, for which purpose the entire chamber would have to admit air.

REFERENCES:
patent: 3206322 (1965-09-01), Morgan
patent: 3524426 (1970-08-01), Ogle, Jr. et al.
patent: 3641973 (1972-02-01), Shrader
patent: 3656454 (1972-04-01), Shrader
patent: 3921572 (1975-11-01), Brunner et al.

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