Vacuum vapor deposition gun assembly

Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

118726, 204298, 219121EE, 219121EF, C23C 1430

Patent

active

045613826

ABSTRACT:
A vapor deposition gun assembly includes a hollow body having a cylindrical outer surface and an end plate for holding an adjustable heat sink, a hot hollow cathode gun, two magnets for steering the plasma from the gun into a crucible on the heat sink, and a shutter for selectively covering and uncovering the crucible.

REFERENCES:
patent: 3267015 (1966-08-01), Morley
patent: 3562141 (1971-02-01), Morley
J. Luce, "Intense Gaseous Discharges", Proceedings of Second U.N. Conference on Peaceful Uses of Atomic Energy, (1958) 31, pp. 305-314.
L. M. Lidsky et al., "Highly Ionized Hollow Cathode Discharge", Journal of Applied Physics, vol. 33, No. 8, Aug. 1962, pp. 2490-2497.
J. R. Morley, "The Hollow Cathode Discharge", Proceedings of the Fifth Annual Meeting of the Electron Beam Symposium, Mar. 28, 1963, p. 368-377.
C. T. Wan et al., "Investigation of Hot-Filament and Hollow-Cathode Electron-Beam Techniques for Ion Plating", Journal of Vac. Sci. and Technol., vol. 8, No. 6, Nov./Dec. 1971, pp. 99-104.
D. G. Williams, "Vacuum Coating with a Hollow Cathode Source", Journal of Vac. Sci. and Technol., vol. 11, No. 1, Jan./Feb. 1974, pp. 374-376.
G. Mah, "PVD by Electron Beam Processes", Plating and Surface Finishing, 1983.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Vacuum vapor deposition gun assembly does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Vacuum vapor deposition gun assembly, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vacuum vapor deposition gun assembly will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1018730

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.