Coating apparatus – Control means responsive to a randomly occurring sensed... – Sampling of associated base
Patent
1978-06-22
1980-06-17
Pianalto, Bernard D.
Coating apparatus
Control means responsive to a randomly occurring sensed...
Sampling of associated base
118697, 118712, 118720, 118730, B05C 1100
Patent
active
042078369
ABSTRACT:
A vacuum vapor-deposition apparatus comprising a turntable for holding some substrates subjected to vapor-deposition, on its circumferential portions; a plurality of evaporating boats disposed opposite to the circumferential portions of the turntable; a plurality of SCR boat power sources for respectively heating the plural evaporating boats; and at least one quartz deposition monitor provided on the turntable, wherein the turntable is rotated for vacuum vapor-deposition so that the evaporated materials from the respective boats are periodically deposited on some substrates to form the start of the successively evaporated materials. This apparatus also includes a coupling device having at least a coupling coil system consisting of a primary coil rotated in synchronism with the turntable and a secondary coil so disposed as to be set concentrically with respect to the primary coil, the coupling device serving to extract an electrical signal from the quartz deposition monitor, a digital frequency counter for directly measuring the natural resonance frequency of the quartz oscilator of the deposition monitor on the basis of the noiseless signal induced in the secondary coil of the coupling system and a computor, whereby it is rendered unnecessary to set the offset frequency of the deposition monitor with the quartz oscilator.
REFERENCES:
patent: 4121537 (1978-10-01), Maruyama et al.
Hitachi , Ltd.
Pianalto Bernard D.
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