Vacuum vapor deposition

Details Vacuum vapor deposition Vacuum vapor deposition

1994-02-03

1995-01-10

Bueker, Richard

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

427580, 118723VE, 20429841, C23C 1400

Patent

active

053804155

ABSTRACT:
A method and apparatus for vapor deposition of a thin metallic film utilizing an ionized gas arc directed onto a source material spaced from a substrate to be coated in a substantial vacuum while providing a pressure differential between the source and the substrate so that as a portion of the source is vaporized the vapors are carried to the substrate. The apparatus includes a modified tungsten arc welding torch having a hollow electrode through which a gas, preferably inert, flows and an arc is struck between the electrode and the source. The torch, source and substrate are confined within a chamber within which a vacuum is draw. When the arc is struck, a portion of the source is vaporized and the vapors flow rapidly toward the substrate. A reflecting shield is positioned about the torch above the electrode and the source to ensure that the arc is struck between the electrode and the source at startup. The electrode and the source may be confined within a vapor guide housing having a duct opening toward the substrate for directing the vapors onto the substrate.

REFERENCES:
patent: 5103766 (1992-04-01), Yoshikawa
patent: 5221349 (1993-06-01), Tamagaki

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