Vacuum ultraviolet referencing reflectometer

Optics: measuring and testing – By light interference – For dimensional measurement

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07394551

ABSTRACT:
A spectroscopy system is provided which operates in the vacuum ultraviolet spectrum. More particularly, a system utilizing reflectometry techniques in the vacuum ultraviolet spectrum is provided for use in metrology applications. To ensure accurate and repeatable measurement, the environment of the optical path is controlled to limit absorption effects of gases that may be present in the optical path. To account for absorption effects that may still occur, the length of the optical path is minimized. To further account for absorption effects, the reflectance data may be referenced to a relative standard. Referencing is particularly advantageous in the VUV reflectometer due to the low available photon flux and the sensitivity of recorded data to the composition of the gaseous medium contained with the optical path. Thus, errors that may be introduced by changes in the controlled environment may be reduced. In one exemplary embodiment, the VUV reflectometer may utilize a technique in which a beam splitter is utilized to create a sample beam and a reference beam to form the two arms of a near balanced Mach Zehnder interferometer. In another exemplary embodiment, the reference channel may be comprised of a Michelson interferometer.

REFERENCES:
patent: 3091154 (1963-05-01), Hall
patent: 3160752 (1964-12-01), Bennett
patent: 3572951 (1971-03-01), Rothwarf et al.
patent: 3825347 (1974-07-01), Kaiser
patent: 4368983 (1983-01-01), Bennett
patent: 4899055 (1990-02-01), Adams
patent: 4984894 (1991-01-01), Kondo
patent: 5042949 (1991-08-01), Greenberg et al.
patent: 5120966 (1992-06-01), Kondo
patent: 5182618 (1993-01-01), Heinonen
patent: RE34783 (1994-11-01), Coates
patent: 5607800 (1997-03-01), Ziger
patent: 5608526 (1997-03-01), Piwonka-Corle et al.
patent: 5747813 (1998-05-01), Norton et al.
patent: 5771094 (1998-06-01), Carter
patent: 5781304 (1998-07-01), Kotidis et al.
patent: 5798837 (1998-08-01), Aspnes et al.
patent: 5880831 (1999-03-01), Buermann et al.
patent: 5900939 (1999-05-01), Aspnes et al.
patent: 5903351 (1999-05-01), Jeong et al.
patent: 5917594 (1999-06-01), Norton
patent: 5991022 (1999-11-01), Buermann et al.
patent: 6128085 (2000-10-01), Buermann et al.
patent: 6129807 (2000-10-01), Grimbergen et al.
patent: 6181427 (2001-01-01), Yarussi et al.
patent: 6184984 (2001-02-01), Lee et al.
patent: 6261853 (2001-07-01), Howell et al.
patent: 6278519 (2001-08-01), Rosencwaig et al.
patent: 6297880 (2001-10-01), Rosencwaig et al.
patent: 6304326 (2001-10-01), Aspnes et al.
patent: 6313466 (2001-11-01), Olsen et al.
patent: 6411385 (2002-06-01), Aspnes et al.
patent: 6414302 (2002-07-01), Freeouf
patent: 6417921 (2002-07-01), Rosencwaig et al.
patent: 6580510 (2003-06-01), Nawracala
patent: 6665075 (2003-12-01), Mittleman et al.
patent: 6710865 (2004-03-01), Forouhi et al.
patent: 6765676 (2004-07-01), Buermann
patent: 6897456 (2005-05-01), Hasegawa et al.
patent: 6897807 (2005-05-01), Hasegawa et al.
patent: 7026626 (2006-04-01), Harrison
patent: 7061614 (2006-06-01), Wang et al.
patent: 7067818 (2006-06-01), Harrison
patent: 7095511 (2006-08-01), Chalmers et al.
patent: 7126131 (2006-10-01), Harrison
patent: 7189973 (2007-03-01), Harrison
patent: 2001/0055118 (2001-12-01), Nawracala
patent: 2002/0030826 (2002-03-01), Chalmers et al.
patent: 2002/0149774 (2002-10-01), McAninch
patent: 2002/0154302 (2002-10-01), Rosencwaig
patent: 2003/0071996 (2003-04-01), Wang et al.
patent: 2004/0150820 (2004-08-01), Nikoonahad et al.
patent: 2005/0036143 (2005-02-01), Huang
patent: 2006/0192958 (2006-08-01), Harrison
patent: 2007/0030488 (2007-02-01), Harrison
Search Report;PCT/US04/30859; 13 pgs.
McPherson Product Brochure “Reflectometer for Sample Analysis,” McPherson, Inc., Massachusetts, Published Prior to Sep. 23, 2003, 1-2 pps.
McPherson Product Brochure “Spectral Reflectometer,” McPherson, Inc., Massachusetts, Nov. 12, 2001, 1 pg.
McPherson Product Brochure “VUVaS Spectrophotometers for 115 nm to >380 nm,” McPherson, Inc., Massachusetts, Published Prior to Sep. 23, 2003, 1-4 pps.
McPherson Product Brochure “VUVaS Spectrophotometers, Made to Measure 115-380 nm,” McPherson, Inc., Massachusetts, Published Prior to Sep. 23, 2003, 1-8 pps.
Acton Research Product Brochure “Acton Research Purged DAMS Optical Measurement System,” Acton Research Corporation, Massachusetts, Published Prior to Sep. 23, 2003, 1-2 pps.
“The Thin Film tool for next generation lithography at 157nm,” Web page from http://www.sopra-sa.com, Sopra, Printed From Internet On Feb. 19, 2002, 1pg.
“SE and GXR combined on the same instrument,” Web page from http://www.sopra-sa.com, Sopra, Printed From Internet on Feb. 19, 2002, 1pg.
“The ideal Thin Film characterization unit for Development and Pilot Line environment,” Web page from http://www.sopra-sa.com, Sopra, Printed From Internet on Feb. 19, 2002, 1 pg.
“VUV-VASE™, The Award Winning VUV-VASE™ is the latest addition to our line of Spectroscopic Ellipsometers,” Web pages from http://www.jawoolam.com, J.A. Woollam Company, Nebraska, Printed From Internet on Nov. 5, 2002, 1-2 pps.
“Vacuum UV Spectroscopic Ellipsometers,” Web pages from http://www.sentech.de, Sentech Instruments, Printed From Internet on Feb. 20, 2002, 1-3 pps.
McPherson Product Brochure “Reflectometer for Sample Analysis,” 3pgs.
McPherson Product Brochure “VUVaS Spectrophotometers for 115 nm to >380 nm,” 4 pgs.
McPherson Product Brochure “VUVaS Spectrophotometers, Made to Measure 115-380 nm,” 8 pgs.
Acton Research Product Brochure “Acton Research Purged DAMS Optical Measurement System,” 2 pgs.
“The Thin Film tool for next generation lithography at 157nm,” Web page from http://www.sopra-sa.com, 1pg.
“SE and GXR combined on the same instrument,” Web page from http://www.sopra-sa.com, 1pg.
“The ideal Thin Film characterization unit for Development and Pilot Line environment,” Web page from http://www.sopra-sa.com, 1 pg.
“VUV-VASE™, The Award Winning VUV-VASE™ is the latest addition to our line of Spectroscopic Ellipsometers,” Web pages from http://www.jawoolam.com, 2 pgs.
“Vacuum UV Spectroscopic Ellipsometers,” Web pages from http://www.sentech.de, 3 pgs.
Rubloff, “Surface Reflectance Spectroscopy System”, Technical Disclosure, Ip.com, www.ip.com, May 1, 1977, 5 pgs.
Copending U.S. Appl. No. 11/800,026; entitled “Broad Band Referencing Reflectometer”, filed May 3, 2007, 100 pgs.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Vacuum ultraviolet referencing reflectometer does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Vacuum ultraviolet referencing reflectometer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vacuum ultraviolet referencing reflectometer will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2807305

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.