Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1992-02-14
1993-04-20
Nguyen, Nam X.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429823, 156345, 118503, C23C 1434
Patent
active
052039811
ABSTRACT:
A vacuum-treatment apparatus employs a magnetically driven clamp which uses repulsive and attractive forces between magnets. The clamp mechanism is simplified, maintenance of the apparatus can be easily performed, and the surfaces which mechanically contact one another are decreased as much as possible so that a vacuum-treatment apparatus which generates less dust is obtained.
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Mitsubishi Denki & Kabushiki Kaisha
Nguyen Nam X.
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