Vacuum transistor having an optical gate

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Low workfunction layer for electron emission

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257622, 313306, 313309, 313336, H01L 2906

Patent

active

053897960

ABSTRACT:
A vacuum transistor having an optical gate in which an optical signal is radiated from the optical gate. The transistor has a silicon substrate; an insulating layer deposited on said silicon substrate, the insulating layer having a recess portion formed by an etching method; an optical source for radiating the optical signal and serving as said optical gate; and two electrodes formed on said insulating layer and separated from each other under a vacuum or an atmosphere. One of the electrodes receives the optical signal and is an electron emitting electrode for emitting electrons, and the other electrode is an electron collecting electrode for collecting the electrons emitted from said electron emitting electrode. The electron emitting electrode is formed beneath said optical source under a vacuum or an atmosphere and is connected to ground; and said electron collecting electrode is connected to a power source. The amount of current flowing in said electron collecting electrode may be adjusted by the intensity of the optical signal from said optical source. The mobility of electrons between the electron emitting electrode and the electron collecting electrode is further improved owing to a vacuum state or an atmosphere state of the electron transferring path.

REFERENCES:
patent: 4303930 (1981-12-01), Van Gorkum et al.
patent: 5202571 (1993-04-01), Hirabayashi et al.
patent: 5204581 (1993-04-01), Andreadakis et al.
patent: 5245247 (1993-09-01), Hosogi
patent: 5245248 (1993-09-01), Chan et al.
patent: 5247223 (1993-09-01), Mori et al.

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