Vacuum system manifold and related methods

Details Vacuum system manifold and related methods Vacuum system manifold and related methods

2007-07-17

2007-07-17

Gerrity, Stephen F. (Department: 3721)

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Methods

With contents treating

C053S459000, C053S512000, C053S570000, C141S010000, C141S065000, C141S114000, C141S313000

Reexamination Certificate

active

11099193

ABSTRACT:
A system which provides a first object defining a first volume and a second object defining a second volume wherein the second object contains the first object. A manifold apparatus is provided which allows a flowable material to flow by vacuum action into the first object and also allows any entrained gas to be transported from the first volume to the second volume without interrupting the vacuum. Methods of use of the system and structures for detachably attaching the manifold apparatus are also provided.

REFERENCES:
patent: 3255959 (1966-06-01), Smith
patent: 3323559 (1967-06-01), Sturges
patent: 4219054 (1980-08-01), Carter et al.
patent: 4307486 (1981-12-01), Matsumoto
patent: 4581764 (1986-04-01), Plock et al.
patent: 5183086 (1993-02-01), Fanta et al.
patent: 5302029 (1994-04-01), Weber et al.
patent: 5350239 (1994-09-01), Strand et al.
patent: 5402918 (1995-04-01), Nishiyama et al.
patent: 5682929 (1997-11-01), Maginot et al.
patent: 5779894 (1998-07-01), Martensson
patent: 6322327 (2001-11-01), Dawson et al.
patent: 6332564 (2001-12-01), Ichikawa
patent: 6374579 (2002-04-01), Muller
patent: 6450775 (2002-09-01), Hutchinson et al.
patent: 6899147 (2005-05-01), Ogawa et al.
patent: 03176303 (1991-07-01), None

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