Vacuum suction membrane for holding silicon wafer

Details Vacuum suction membrane for holding silicon wafer Vacuum suction membrane for holding silicon wafer

2006-07-04

2006-07-04

Shakeri, Hadi (Department: 3723)

Abrading

Machine

Rotary tool

C451S388000

Reexamination Certificate

active

07070490

ABSTRACT:
A membrane for vacuum suction of a silicon water typically used inside a polishing head. The membrane has a flat main body and a plurality of protrusions each having a spiny shape over the surface of the flat main body. The protrusions are formed in positions that correspond to the holes of a supporting multiple-hole panel. The protrusions on the flat main body lower the suction pressure between the wafer and the membrane somewhat so that wafer unloading failure is minimized.

REFERENCES:
patent: 3033298 (1962-05-01), Johnson
patent: 3747282 (1973-07-01), Katzke
patent: 4778326 (1988-10-01), Althouse et al.
patent: 5423716 (1995-06-01), Strasbaugh
patent: 5624299 (1997-04-01), Shendon
patent: 6513796 (2003-02-01), Leidy et al.
patent: 6537141 (2003-03-01), Liu et al.

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