Vacuum sputtering cathode

Details Vacuum sputtering cathode Vacuum sputtering cathode

2005-01-10

2009-12-15

McDonald, Rodney G (Department: 1795)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C204S298120

Reexamination Certificate

active

07632383

ABSTRACT:
A vacuum sputtering cathode includes a target support having a cooler. The cathode includes a support base on which a frame is disposed. The frame defines at least one cavity for the circulation of a coolant. A membrane is disposed on top of the frame and the base, frame and membrane are assembled at the periphery of the target.

REFERENCES:
patent: 4437966 (1984-03-01), Hope et al.
patent: 5071535 (1991-12-01), Hartig et al.
patent: 5147521 (1992-09-01), Belli et al.
patent: 5269894 (1993-12-01), Kerschbaumer
patent: 5421978 (1995-06-01), Schuhmacher et al.
patent: 5863397 (1999-01-01), Tu et al.
patent: 295 12 094 (1996-03-01), None
patent: 01-132758 (1989-05-01), None
patent: 02-205669 (1990-08-01), None
Japio Abstract of 01-132758 dated May 1989.
Derwent Abstract of 01-132758 dated May 1989.
Japio Abstract of 02-205669 dated Aug. 1990.

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