Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1975-03-10
1976-09-21
Mack, John H.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
118 49, 118 491, 118 495, 118 50, 118 501, C23C 1500, C23C 1308
Patent
active
039817911
ABSTRACT:
Vacuum sputtering apparatus for treating articles having a housing forming a main vacuum chamber with a plurality of work stations therein. A lock chamber is provided in the main vacuum chamber through which articles can be inserted and removed. Means is provided in the main vacuum chamber for advancing the articles sequentially through the work stations in the main chamber so that as articles are being removed from the lock chambers, articles which have passed through the work stations can be removed from the main vacuum chamber through the lock chamber.
In the method articles are introduced into the main vacuum chamber through a lock chamber, and they are intermittently progressively advanced through a plurality of work stations in the main vacuum chamber and then are removed through the lock chamber.
REFERENCES:
patent: 3568632 (1971-03-01), Cawthon
patent: 3652444 (1972-03-01), Lester et al.
patent: 3776830 (1973-12-01), Endo
patent: 3827966 (1974-08-01), Needham
patent: 3856654 (1974-12-01), George
patent: 3874525 (1975-04-01), Hassan et al.
C. H. George, "Cylindrical Diode continuous vacuum Sputtering Equipment for Laboratory & High Volume Production," J. Vac. Sci. Tech., vol. 10, No. 2, Mar./Apr. 1973, pp. 393-397.
Mack John H.
Signetics Corporation
Weisstuch Aaron
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