Vacuum pumping system

Details Vacuum pumping system Vacuum pumping system

2006-08-22

2006-08-22

Freay, Charles G. (Department: 3746)

Pumps

Processes

C417S205000, C417S313000

Reexamination Certificate

active

07094036

ABSTRACT:
A vacuum pumping system comprises a first gas supply for supplying a first gas, such as xenon, to a vacuum chamber. A pump receives the gas output from the chamber. A second gas supply supplies a purge gas, such as nitrogen or helium, for pumping with the first gas. A gas separator receives the pumped gases exhausted by the pump, and recovers the first gas and the purge gas from the stream. The recovered first gas is recirculated through the vacuum chamber, and the recovered second gas is recirculated through at least the pump.

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patent: 10-259793 (1998-09-01), None
patent: 2000-81857 (2002-03-01), None
T. Mitsushina, F. Shinji, M. Hidetoshi; Abstract of JP 2000-81857 A, dated Mar. 22, 2002 entitled Rear Gas Recovering Method and Device Therefor; WPI/Derwent.
I. Masashi, S. Mitsuru, O. Masatomo; Abstract of JP 10-259793, dated Sep. 29, 1998 entitled Molecular Pump; WPI/Derwent.
United Kingdom Patent Office Search Report Application No. GB0407081.9; Date of search: Aug. 5, 2004.

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