Vacuum pumping stand

Pumps – One fluid pumped by contact or entrainment with another – Contact or entrainment within rotary impeller

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Details

417203, 417205, 417251, F04C 2300, F04C 2502, F04C 4106, F04C 2516

Patent

active

055954774

ABSTRACT:
A vacuum pumping stand for the cyclic pumping-down of containers and for maintaining an operating vacuum in the containers, for the pumping-down of the container. The vacuum pumping stand has a first and a second vacuum pump which are arranged in series and form a first and a second pumping stage. The first vacuum pump is a radial flow compressor with a controllable throttle which is located in the intake pipe to the first vacuum pump. The second vacuum pump is a rotary compressor or a water ring pump. The second vacuum pump is located in a vacuum pipe in parallel to an outlet pipe of the first vacuum pump and is connected with its inlet at a branch-off with the outlet pipe. A control part is situated in each of the outlet pipe and the vacuum pipe downstream of the branch-off for directing the delivered volume at higher pressures from the first vacuum pump directly or at lower pressures from the first vacuum pump by way of the second vacuum pump 13 to the outlet 10 of the vacuum pump stand.

REFERENCES:
patent: 1711902 (1929-05-01), Neumann
patent: 3642384 (1972-02-01), Huse
patent: 3922110 (1975-11-01), Huse
patent: 4225288 (1980-09-01), Mugele et al.
patent: 4505647 (1985-03-01), Alloce et al.
patent: 4699570 (1987-10-01), Bohn
patent: 4850806 (1989-07-01), Morgan et al.
patent: 5244352 (1993-09-01), Mugele

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