Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1991-08-19
1994-08-23
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429803, 20429832, 156345, C23C 1434
Patent
active
053404602
ABSTRACT:
A vacuum processing equipment is disclosed, which comprises a vacuum chamber and main and fore vacuum pumping mechanism for pumping down the vacuum chamber. The fore vacuum pumping mechanism includes a cooling means and a residual gas trapping means coupled to the cooling means. The cooling means is provided outside the vacuum chamber. The residual gas trapping means is provided in a zone of the vacuum chamber free from interference with the vacuum processing.
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Ishida Tetsuo
Kobayashi Masahiko
Takahashi Nobuyuki
Takemura Hirobumi
Anelva Corporation
Manzo Edward D.
Murphy Mark J.
Nguyen Nam
Ringsred Ted K.
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