Vacuum processing equipment

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

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Details

20429803, 20429832, 156345, C23C 1434

Patent

active

053404602

ABSTRACT:
A vacuum processing equipment is disclosed, which comprises a vacuum chamber and main and fore vacuum pumping mechanism for pumping down the vacuum chamber. The fore vacuum pumping mechanism includes a cooling means and a residual gas trapping means coupled to the cooling means. The cooling means is provided outside the vacuum chamber. The residual gas trapping means is provided in a zone of the vacuum chamber free from interference with the vacuum processing.

REFERENCES:
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patent: 4428811 (1984-01-01), Sproul et al.
patent: 4475045 (1984-10-01), Holden et al.
patent: 4846948 (1989-07-01), Saito et al.
patent: 4849081 (1989-07-01), Ross
patent: 4956043 (1990-09-01), Kanetomo et al.
patent: 4966669 (1990-10-01), Sadamori et al.

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