Vacuum processing device

Details Vacuum processing device Vacuum processing device

2005-04-05

2005-04-05

Hassanzadeh, Parviz (Department: 1763)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With measuring, sensing, detection or process control means

C156S345130, C156S345150, C156S345310, C156S345320, C118S719000, C414S936000, C414S939000

Reexamination Certificate

active

06875306

ABSTRACT:
A vacuum processing device includes at least one vacuum processing chamber for performing predetermined treatments to a wafer being transferred to a predetermined position within the chamber, an atmospheric transfer equipment for transferring a wafer in atmospheric air to a vacuum transfer equipment which is disposed within a vacuum transfer chamber connecting the atmospheric air and the vacuum processing chambers for transferring the wafer received from the atmospheric transfer equipment to the predetermined position within the vacuum processing chamber, and wafer position sensors disposed near the ingress path leading into the processing chamber for detecting the displacement of the wafer being transferred.

REFERENCES:
patent: 5452521 (1995-09-01), Niewmierzycki
patent: 5512320 (1996-04-01), Turner et al.

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