Vacuum processing apparatus, vacuum processing method, and metho

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means

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118715, 20429825, 20429832, 20429833, 20429835, 134 11, 134 12, 134 13, 216 59, 216 63, 216 67, 438905, C23F 102, C23C 1600, C23C 1456, B08B 700

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056162081

ABSTRACT:
A vacuum processing apparatus includes a plurality of vacuum processing chambers for processing a target object using a process gas, a vacuum convey chamber, connected to the plurality of vacuum processing chambers, for loading/unloading the target object into/from the processing chambers, an opening/closing means opened/closed to cause the plurality of vacuum processing chambers to communicate with the vacuum convey chamber, and a cleaning gas supply means for supplying a cleaning gas containing ClF.sub.3 into at least one of the vacuum convey chamber and the plurality of vacuum processing chambers. The cleaning gas is supplied-into the plurality of vacuum processing chambers and the vacuum convey chamber communicating with each other by opening the opening/closing means to clean the plurality of vacuum processing chambers and the vacuum convey chamber.

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patent: 5186718 (1993-02-01), Tepman et al.
patent: 5254176 (1993-10-01), Ibuka et al.
patent: 5286296 (1994-02-01), Sato et al.
patent: 5308431 (1994-05-01), Maher et al.
patent: 5365772 (1994-11-01), Ueda et al.
patent: 5380370 (1995-01-01), Niino et al.

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