Vacuum processing apparatus in which high frequency powers...

Details Vacuum processing apparatus in which high frequency powers... Vacuum processing apparatus in which high frequency powers...

2006-05-30

2006-05-30

Smoot, Stephen W. (Department: 2813)

Coating apparatus

Gas or vapor deposition

With treating means

C438S585000

Reexamination Certificate

active

07051671

ABSTRACT:
A vacuum processing method including placing an article to be processed in a reaction container and simultaneously supplying at least two high-frequency powers having different frequencies to the same high-frequency electrode to generate plasma in the reaction container by the high-frequency powers introduced into the reaction container from the high-frequency electrode. The frequencies and power values of the at least two high-frequency powers supplied satisfy a required relationship.

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