Vacuum processing apparatus and method

Details Vacuum processing apparatus and method Vacuum processing apparatus and method

2011-08-09

2011-08-09

Moore, Karla (Department: 1716)

Coating apparatus

Gas or vapor deposition

Multizone chamber

C156S345310, C156S345320, C414S939000

Reexamination Certificate

active

07993458

ABSTRACT:
A gas exhaust unit evacuates the inside of a vacuum transfer chamber at a constant exhaust rate. An gas exhaust valve is kept normally open, and a purge gas (N2gas) is supplied from a purge gas supply source into the vacuum transfer chamber via a mass flow controller (MFC) and an opening/closing valve. A main control unit controls a pressure in the vacuum transfer chamber to be within a specified range through a flow rate set value for the MFC while monitoring a pressure in the vacuum transfer chamber via a vacuum gauge. The main control unit determines occurrence of abnormality when the pressure exceeds a specified upper limit and then takes such actions as changing a flow rate set value for the MFC, giving an alarm and stopping the operation of a vacuum processing apparatus.

REFERENCES:
patent: 6510365 (2003-01-01), Nishinakayama et al.
patent: 6828235 (2004-12-01), Takano
patent: 2003/0209322 (2003-11-01), Pfeiffer et al.
patent: 2006/0021575 (2006-02-01), Ishizawa et al.
patent: 1669136 (2005-09-01), None
patent: 3-87386 (1991-04-01), None
patent: 2000-127069 (2000-05-01), None
patent: 2003-017478 (2003-01-01), None
patent: 2003-297760 (2003-10-01), None
patent: 2005-200680 (2005-07-01), None
patent: 485531 (2002-05-01), None
Office Action issued Oct. 29, 2010, in China Patent Application No. 200780000117.8, mailing date Oct. 29, 2010 (with English language Translation).

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